SMIF POD (Multi/Single Type) "SEMI Standard Compliant"
Thorough electrostatic measures protect the reticle, and a unique mechanism minimizes the risk of wear and damage from mechanical shocks during handling.
The SMIF Pod (Multi/Single Type) is used to protect reticles in the lithography process of semiconductor front-end manufacturing. 【Features】 ■ Enhanced rigidity and durability - Made of metal, it offers improved rigidity and durability compared to conventional resin types. ■ Low dust generation and easy-to-clean linerless design - Compatible with reticles of 365nm, 248nm, and 193nm (contains no phosphoric additives in plastic) ■ Approved by major exposure equipment manufacturers ■ Compatible with ultrasonic cleaning and pure water cleaning systems ■ Suitable for hot air nozzles and radiation-type vacuum drying ovens ■ Maximum temperature during drying: 60°C (uniform) Operating temperature: 18°C to 30°C * Proven track record with domestic and international device manufacturers * For more details, please contact us.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
